Leading-edge microelectronic processes require very clean process chemicals that are highly filtered and regulated to a particle size of 20 nm or below. With 20 nm particle sensitivity, the Chem 20 Chemical Particle Counter from Particle Measuring Systems (PMS)is the world’s most sensitive particle sensor for high purity process chemicals and latest addition to our full line of liquid particle counters.

Extensive data on chemical distribution and packaging systems proves that the Chem 20 chemical particle counter, with 20 nm sensitivity, detects larger concentrations of particles with better statistics than competitive products. The Chem 20 Chemical Particle Counter is a valuable tool that enables facility and process engineers to quickly detect and characterize chemical particle sources before they impact process and device performance.

The Chem 20 is one of Particle Measuring Systems’ “Industry Leading Sensitivity” products. This means that there are no products on the market that are more sensitive than these and only PMS offers a line of products covering this many elements of production monitoring.  PMS currently leads the market in monitoring performance, sensitivity and reliability in the Ultrapure Water, Chemical and Airborne Molecular Contamination Monitoring fields. PMS’ superior knowledge, technology and service provides High Tech and Chemical manufacturing companies the most advanced tools to make accurate data-driven decisions, improving both performance and yield. 

• 20 nm Chemical particle counter now with Syringe particle sampling capability
• Advanced laser optics and detectors enable 20 nm particle sensitivity in chemicals
• On-board chemical flow meter to set sample flow
• First chemical particle counter optimized for low and high refractive index chemicals for improved performance:
• Chem 20 chemical particle counter, for chemicals with lower indices of refraction
• Chem 20-HI chemical particle counter, tailored for sulfuric acid and other higher-index chemicals
• On-board leak detection to provide alarm upon an internal chemical leak
• Low-flow detector and alarm to ensure consistent data
• Bubble detector to optimize data and protect sensor
• Local data display

• Detect 20 nm PSL & 9 nm Au particles in real time
• Now 20 nm testing is easily accomplished in both online and offline applications
• Detect yield-limiting particles (not possible with competitive technologies)
• React quickly to particle excursions long before surface scan or yield data are available
• Optimize chemical delivery systems from the loading dock to point-of-process
• Tighten process control limits through improved sample population statistics
• Optimize instrument operation for very dirty or very clean applications using two view modes, extending product application space
• Support legacy data acquisition systems with flexible communications

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